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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Detection capability for chrome defect of tri-tone PSM
Lee, Jung-Kwan, Tanabe, Hiroyoshi, Kim, Dae-Woo, Shin, Kyong-Mun, Lee, Dong-Heok, Kim, Jin-Min, Choi, Sang-SooVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504205
File:
PDF, 101 KB
english, 2003