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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Improvement of empirical OPC model robustness using full-chip aerial image analysis
Roessler, Thomas, Kimmel, Kurt R., Staud, Wolfgang, Frankowsky, Beate, Toublan, OlivierVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.518055
File:
PDF, 222 KB
english, 2003