SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Data Analysis and Modeling for Process Control II - Optimization of multi-step development scheme to improve the critical dimension uniformity
Chang, Hsien-an, Emami, Iraj, Lin, Benjamin Szu-Min, Hung, Kuei-Chun, Fang, Shu-Ping, Hsu, Te-shaoVolume:
5755
Year:
2005
Language:
english
DOI:
10.1117/12.599321
File:
PDF, 64 KB
english, 2005