SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Stencil pattern accuracy of EPL masks
Sugimura, Hiroshi, Komuro, Masanori, Yamazaki, Tsukasa, Susa, Takashi, Negishi, Yoshiyuki, Yoshii, Takashi, Eguchi, Hideyuki, Tamura, AkiraVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617279
File:
PDF, 309 KB
english, 2005