SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Model-based lithography verification system for multilayer structure in electron-beam direct writing
Ogino, Kozo, Lercel, Michael J., Hoshino, Hiromi, Machida, YasuhideVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.656105
File:
PDF, 409 KB
english, 2006