SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Optical critical dimension measurement and illumination analysis using the through-focus focus metric
Attota, Ravikiran, Archie, Chas N., Silver, Richard M., Bishop, Michael R., Dixson, Ronald G.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656421
File:
PDF, 1.04 MB
english, 2006