SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Femtopulse laser-based mask repair in the DUV wavelength regime
Ghadiali, Firoz, Hoga, Morihisa, Tolani, Vikram, Nagpal, Rajesh, Robinson, Tod, LeClaire, Jeff, Bozak, Ron, Lee, David A., White, RoyVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681779
File:
PDF, 930 KB
english, 2006