SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Mask quality assurance in cleaning for haze elimination using flexible mask specifications
Otsubo, Kyo, Watanabe, Hidehiro, Yamaguchi, Shinji, Arisawa, Yukiyasu, Mukai, Hidefumi, Kotani, Toshiya, Mashita, Hiromitsu, Hashimoto, Hiromitsu, Kamo, Takashi, Tsutsui, Tomohiro, Ikenaga, OsamuVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728921
File:
PDF, 657 KB
english, 2007