SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Study of mask structure for 45-nm node based on manufacturability and lithographic performance
Doh, Jong Gul, Watanabe, Hidehiro, Park, Cheol Hong, Moon, Yong Seung, Kim, Bo Hye, Kwon, Sung Won, Choi, Sun Young, Kim, Sung Hyuck, Kim, Seong Yoon, Kim, Byung Gook, Woo, Sang Gyun, Cho, Han KuVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728977
File:
PDF, 1.16 MB
english, 2007