![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Implementation of double dipole lithography for 45-nm node poly and diffusion layer manufacturing with 0.93NA
Wu, Meng-Hsiu, Watanabe, Hidehiro, Hsu, Michael, Hsu, Stephen, Lu, Bo-Jou, Cheng, Yung-Feng, Chou, Yueh-Lin, Yang, Chuen-HueiVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.729020
File:
PDF, 870 KB
english, 2007