SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Spectroscopic ellipsometer for ultra thin film
Akashika, Kumiko, Allgair, John A., Raymond, Christopher J., Shiota, Shuji, Yamaguchi, Shinji, Horie, Masahiro, Kobayashi, MasayoshiVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.772414
File:
PDF, 215 KB
english, 2008