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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Degradation of pattern quality due to strong electron scattering in EUV mask
Choi, Jin, Montgomery, M. Warren, Maurer, Wilhelm, Lee, Rae Won, Lee, Sang Hee, Ahn, Byung Sup, Kim, Hee Bom, Woo, Sang-Gyun, Cho, Han KuVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.864212
File:
PDF, 1.18 MB
english, 2010