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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Enabling 22-nm logic node with advanced RET solutions
Farys, V., Depre, L., Finders, J., Arnoux, V., Trouiller, Y., Liu, H. Y., Yesilada, E., Zeggaoui, N., Alleaume, C.Volume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.870753
File:
PDF, 397 KB
english, 2011