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ChemInform Abstract: Low Pressure Deposition of Doped SiO2 by Pyrolysis of Tetraethylorthosilicate (TEOS). Part 1. Boron and Phosphorus Doped Films.
BECKER, F. S., ROEHL, S.Volume:
19
Journal:
ChemInform
DOI:
10.1002/chin.198809396
Date:
March, 1988
File:
PDF, 120 KB
1988