ChemInform Abstract: Optimized Deposition Parameters for...

ChemInform Abstract: Optimized Deposition Parameters for Low Pressure Chemical Vapor Deposited Titanium Silicide.

ILDEREM, V., REIF, R.
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Volume:
20
Journal:
ChemInform
DOI:
10.1002/chin.198905324
Date:
January, 1989
File:
PDF, 133 KB
1989
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