SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - X-ray lithography processing at CXrL from beamline to quarter-micron NMOS devices
Nachman, Ramez, Chen, Gong, Reilly, Michael T., Wells, Gregory M., Wallace, John P., Li, Hsin H., Krasnoperova, Azalia A., Anderson, Paul D., Brodsky, Eric, Ganin, Eti, Campbell, Stephen A., Taylor, JVolume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175835
File:
PDF, 736 KB
english, 1994