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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Alternative soft x-ray source for step-and-scan lithography
Piestrup, Melvin A., Powell, Michael W., Lombardo, Louis W., Seeger, David E.Volume:
2723
Year:
1996
Language:
english
DOI:
10.1117/12.240481
File:
PDF, 317 KB
english, 1996