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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Edge-phase-shifting lithography for sub-0.3-μm T-gates
Huelsmann, Axel, Becker, Fred, Hornung, Jochen, Koehler, Dagmar, Schneider, Joachim, Fuller, Gene E.Volume:
3051
Year:
1997
Language:
english
DOI:
10.1117/12.276025
File:
PDF, 677 KB
english, 1997