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SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Wednesday 1 October 1997)] Microelectronic Device Technology - Impact of nitrogen ion-implantation on deep submicron SALICIDE process
Lim, Chong W., Lahiri, Syamal, Tung, C. H., Wong, Sang M., Lee, Kong H., Wong, Harianto, Pey, Kin L., Chan, Lap H., Rodder, Mark, Tsuchiya, Toshiaki, Burnett, David, Wristers, DirkVolume:
3212
Year:
1997
Language:
english
DOI:
10.1117/12.284587
File:
PDF, 865 KB
english, 1997