SPIE Proceedings [SPIE Microelectronic Manufacturing Technologies - Edinburgh, United Kingdom (Wednesday 19 May 1999)] Lithography for Semiconductor Manufacturing - Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node
Petersen, John S., McCallum, Martin, Kachwala, Nishrin, Socha, Robert J., Chen, J. Fung, Laidig, Thomas L., Smith, Bruce W., Gordon, Ronald L., Mack, Chris A., Mack, Chris A., Stevenson, TomVolume:
3741
Year:
1999
Language:
english
DOI:
10.1117/12.346877
File:
PDF, 2.37 MB
english, 1999