SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Suppression of resist pattern deformation on SiON bottom antireflective layer in deep-UV lithography
Yamanaka, Ryoko, Hattori, Takashi, Mine, Toshiyuki, Hattori, Keiko T., Tanaka, Toshihiko P., Terasawa, Tsuneo, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350202
File:
PDF, 1019 KB
english, 1999