SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Use of programmed multilayer defects in validating a defect compensation strategy for EUV lithography
Ray-Chaudhuri, Avijit K., Cardinale, Gregory F., Fisher, Aaron, Mangat, Pawitter J. S., Liang, Ted, Sweeney, Donald W., Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373378
File:
PDF, 719 KB
english, 1999