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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Advanced Write Tool Effects on 100-nm Node OPC
Buck, Peter D., Green, Kent G., Ibsen, Kent B., Nakagawa, Kent H., Hong, Dongsung, Krishnan, Prakash, Coburn, Dianna, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.467761
File:
PDF, 451 KB
english, 2002