![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Spectroscopic CD metrology for sub-100-nm lithography process control
Mieher, Walter D., Dziura, Thaddeus G., Chen, Xuemei, DeCecco, Paola, Levy, Ady, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473424
File:
PDF, 205 KB
english, 2002