SPIE Proceedings [SPIE Design, Process Integration, and Characterization for Microelectronics - Santa Clara, CA (Wednesday 6 March 2002)] Design, Process Integration, and Characterization for Microelectronics - Enabling the 70-nm technology node with 193-nm altPSM lithography
Liebmann, Lars W., Lund, Jennifer, Graur, Ioana C., Heng, Fook-Luen, Fonseca, Carlos A., Culp, James, Gabor, Allen H., Starikov, Alexander, Tobin, Jr., Kenneth W.Volume:
4692
Year:
2002
Language:
english
DOI:
10.1117/12.475663
File:
PDF, 296 KB
english, 2002