![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Process latitude measurements and their implications for CD control in EUV lithography
Cobb, Jonathan, Mackay, R. Scott, Peters, Richard, Postnikov, Sergei, Hector, Scott D., Lu, Bing, Weisbrod, Eric, Wasson, James R., Mangat, Pawitter, O'Connell, DonnaVolume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.537366
File:
PDF, 305 KB
english, 2004