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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Data Analysis and Modeling for Process Control - In-tool process control for advanced patterning based on integrated metrology
Mui, David S. L., Tobin, Jr., Kenneth W., Sasano, Hiroki, Liu, Wei, Yamartino, John, Skumanich, AndrewVolume:
5378
Year:
2004
Language:
english
DOI:
10.1117/12.537444
File:
PDF, 361 KB
english, 2004