SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Dome scatterometry for the measurement of advanced geometry semiconductor devices
Raymond, Christopher J., Archie, Chas N., Littau, Mike, Forman, Darren, Hummel, Steven G.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656466
File:
PDF, 330 KB
english, 2006