SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Systematic defect inspection and verification for distributions of critical dimension in OPC models utilizing design based metrology tool
Park, Jeong-Geun, Allgair, John A., Raymond, Christopher J., Lee, Sang-ho, Kang, Young-Seog, Park, Young-Kyou, Kitamura, Tadashi, Hasebe, Toshiaki, Nakazawa, ShinichiVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.772574
File:
PDF, 896 KB
english, 2008