SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Analysis of trade-off relationships in resist patterns delineated using SFET of Selete
Kozawa, Takahiro, Allen, Robert D., Oizumi, Hiroaki, Itani, Toshiro, Tagawa, SeiichiVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846500
File:
PDF, 3.14 MB
english, 2010