SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Impact of polymerization process on OOB on lithographic performance of a EUV resist
Jain, Vipul, La Fontaine, Bruno M., Naulleau, Patrick P., Coley, Suzanne M., Lee, Jung June, Christianson, Matthew D., Arriola, Daniel J., LaBeaume, Paul, Danis, Maria E., Ortiz, Nicolas, Kang, Su-JinVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.879487
File:
PDF, 550 KB
english, 2011