Etching characteristics of a silicon surface induced by...

International Journal of Manufacturing Technology and Management 2006 Vol. 9; Iss. 1/2

Etching characteristics of a silicon surface induced by focused ion beam irradiation

Kawasegi, Noritaka, Morita, Noboru, Yamada, Shigeru, Takano, Noboru, Oyama, Tatsuo, Ashida, Kiwamu, Taniguchi, Jun, Miyamoto, Iwao, Momota, Sadao
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Volume:
9
Year:
2006
Language:
english
Journal:
International Journal of Manufacturing Technology and Management
DOI:
10.1504/ijmtm.2006.009984
File:
PDF, 1.34 MB
english, 2006
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