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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III - Fabrication of x-ray masks with 0.15-um level two-dimensional patterns by using highly accurate FIB lithography
Fujiwara, Shuji, Yamaoka, Y., Harada, M., Nishino, Junichi, Yuasa, R., Inai, M., Suzuki, S., Tanaka, T., Morigami, M., Watanabe, Takeo, Yamashita, Yoshio, Patterson, David O.Volume:
1924
Year:
1993
Language:
english
DOI:
10.1117/12.146535
File:
PDF, 226 KB
english, 1993