![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - High speed optical metrology solution for after etch process monitoring and control
Cain, Jason P., Sanchez, Martha I., Charley, Anne-Laure, Leray, Philippe, Pypen, Wouter, Cheng, Shaunee, Verma, Alok, Mattheus, Christine, Wisse, Baukje, Cramer, Hugo, Niesing, Henk, Kruijswijk, StefaVolume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2047280
File:
PDF, 1002 KB
english, 2014