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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Direct-scatterometry-enabled PEC model calibration with two-dimensional layouts
Cain, Jason P., Sanchez, Martha I., Yang, Yi-Yeh, Lee, Hsuan-Ping, Liu, Chun-Hung, Yu, Hao-Yun, Tsai, Kuen-Yu, Li, Jia-HanVolume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2048683
File:
PDF, 3.70 MB
english, 2014