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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Optimization of stepper parameters and their influence on OPC
Vallishayee, Rakesh R., Orszag, Steven A., Barouch, Eytan, Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240931
File:
PDF, 248 KB
english, 1996