SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Process margin in ArF lithography using an alternating phase-shifting mask
Matsuo, Takahiro, Nakazawa, Keisuke, Ogawa, Tohru, Grenon, Brian J., Abboud, Frank E.Volume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332866
File:
PDF, 1.06 MB
english, 1998