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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Application of spatial signature analysis to electrical test data: validation study
Karnowski, Thomas P., Tobin, Jr., Kenneth W., Gleason, Shaun S., Lakhani, Fred, Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350840
File:
PDF, 2.06 MB
english, 1999