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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Defects and metrology of ultrathin resist films
Okoroanyanwu, Uzodinma, Cobb, Jonathan L., Dentinger, Paul M., Henderson, Craig C., Rao, Veena, Monahan, Kevin M., Luo, David, Pike, Christopher, Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386506
File:
PDF, 3.25 MB
english, 2000