![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Characterization of an acetal-based chemically amplified resist for 257-nm laser mask fabrication
Rathsack, Benjamen M., Tabery, Cyrus E., Albelo, Jeff A., Buck, Peter D., Willson, C. Grant, Grenon, Brian J., Dao, Giang T.Volume:
4186
Year:
2001
Language:
english
DOI:
10.1117/12.410739
File:
PDF, 653 KB
english, 2001