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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Reliable Sub-Nanometer Repeatability for CD Metrology in a Reticle Production Environment
Hourd, Andrew C., Grimshaw, Anthony, Scheuring, Gerd, Gittinger, Christian, Doebereiner, Stefan, Hillmann, Frank, Brueck, Hans-Juergen, Chen, Shiuh-Bin, Chen, Parkson W., Jonckheere, Rik M., PhilipsenVolume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.468090
File:
PDF, 426 KB
english, 2002