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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Amplitude and spatial frequency characterization of line-edge roughness using CD-SEM
Eytan, Guy, Dror, Ophir, Ithier, Laurent, Florin, Brigitte, Lamouchi, Zakir, Martin, Nadine, Herr, Daniel J. C.Volume:
4689
Year:
2002
DOI:
10.1117/12.473473
File:
PDF, 330 KB
2002