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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Model of coating and drying process for flat polymer film fabrication
Kagami, Hiroyuki, Miyagawa, Ryuji, Kawata, Atsushi, Nakashima, Daisuke, Kobayashi, Shinji, Kitano, Takahiro, Takeshita, Kazuhiro, Kubota, Hiroshi, Ohmi, Tadahiro, Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476948
File:
PDF, 246 KB
english, 2002