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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Simulation of mask CD variation for different local densities with in-house developed e-beam lithography simulator
Kim, Mi-Young, Kimmel, Kurt R., Staud, Wolfgang, Ki, Won-Tai, Lee, Sung-Hoon, Choi, Ji-Hyeon, Choi, Seong-Woon, Sohn, Jung-MinVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.518028
File:
PDF, 279 KB
english, 2003