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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system
Jang, Sung-Hoon, Tanabe, Hiroyoshi, Yang, Seung-Hune, Ahn, Byoung-Sup, Ki, Won-Tai, Choi, Ji-Hyeon, Choi, Sung-Woon, Han, Woo-SungVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557757
File:
PDF, 390 KB
english, 2004