![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Evaluation of dry etching and defect repair of EUVL mask absorber layer
Abe, Tsukasa, Staud, Wolfgang, Weed, J. Tracy, Nishiguchi, Masaharu, Amano, Tsuyoshi, Motonaga, Toshiaki, Sasaki, Shiho, Mohri, Hiroshi, Hayashi, Naoya, Tanaka, Yuusuke, Nishiyama, IwaoVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569397
File:
PDF, 797 KB
english, 2004