![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - A novel assist feature for contact holes to overcome problematic pitches
Yang, Mars, Smith, Bruce W., Lin, Francis, Yang, Elvis, Yang, T. H., Chen, K. C., Ku, Joseph, Lu, C. Y.Volume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.600244
File:
PDF, 425 KB
english, 2005