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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Improving lithography intra wafer CD for C045 implant layers using STI thickness feed forward?
Massin, Jean, Orlando, Bastien, Gatefait, Maxime, Chapon, Jean-Damien, Le-Gratiet, Bertrand, Minghetti, Blandine, Goirand, Pierre-JérômeVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.775708
File:
PDF, 617 KB
english, 2008