SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Case study: the impact of VSB fracturing
Dillon, Brian, Horiuchi, Toshiyuki, Norris, TimVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793023
File:
PDF, 236 KB
english, 2008