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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Next generation siloxane-based Bottom Anti-Reflective Coating (BARC) formulations with selective strip rates and required optical properties
Mukhopadhyay, Sudip, Levinson, Harry J., Dusa, Mircea V., Kennedy, Joseph, Pandey, Yamini, Amin, Preeti, Gill, JaswinderVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814398
File:
PDF, 308 KB
english, 2009